Laboratory table Horizontal Diffusion Furnace (SVCS)

Laboratory table top Horizontal Diffusion Furnace (SVCS)

Ideally suited for R&D laboratories and pilot production

The SVCS Tabletop Furnace system provides a semiconductor grade quality tool for universities, R&D laboratories and pilot fabs. This system can be used for wide range of processes due to outstanding flexibility and amount of optional modules available to meet special and often unique requirements of every customer.

Processes

• Gas, liquid or solid state source diffusion
• Dry or Wet oxidation + Trans-LC
• Annealing (forming gas or nitrogen)
• Sintering
• Polyimide baking/curing
• Atmospheric, LPCVD, PECVD
• Silicon Nitride
• poly-Si, α-Si
• TEOS, HTO, LTO
• Graphene, CNTs, Nanowires

Features

• Atmospheric or Vacuum design
• Small footprint
• Low power consumption
• Easy operation and maintenance
• Heating element with 1 or 3 temperature zones, max. temperature up to 1300 oC
• Modern modular proprietary control system
• Up to 8 gas lines and 2 liquid sources
• Independent hardware safety interlocks
• Integration of vacuum pump systems in cooperation with leading pump manufacturers

  Technical Data

  Wafer size	2″ – 6″ (50 mm – 150 mm)
  Wafer load	up to 25 wafers/batch
  Heating system	1 or 3 zone, helical Kanthal® APM/A1 wire
  Flat zone	12″ (300 mm)
  Process temperature	200 oC  –  1300 oC, ± 0.5 oC across flat zone
  Power consumption	20 kVA total
  Power supply	3-phase, 400 or 480VAC, 50 A, 50 or 60 Hz (system is always adapted to country- specific power supply network)
  Clean dry air	70 – 110 psig (4,8 to 7,6 bar)
  Cooling water	40 – 60 LPM
  Exhaust	210 m³/h
  Options	CEM unit, EBS system, facility equipment