Photoresist coating and Developing (Lithography Process)

SPIN-1200T from MIDAS SYSTEM (korea) - Table Top Spin Coater. 

Touch panel control , Compact unit for various coating solutions , Programmable Recipe management , Easy operation

Wafers: from pieces 5х5 mm to wafers 100 mm (up tp 150 mm - with special fieture)

SPIN-3000D from MIDAS SYSTEM (Korea) - Table Top Spin Coater. 

Touch panel control , Compact unit for various coating solutions , Programmable Recipe management , Easy operation , Adopt Drain , Exhaust hole in bowl
Wafers: from pieces 5х5 mm to wafers 150 mm

SPIN-3000A from MIDAS SYSTEM (Korea) - Table Top Spin Coater. 

Touch panel control , Compact unit for various coating solutions , Programmable Recipe management , Easy operation , Adopt Drain , Exhaust hole in bowl
Wafers: from pieces 5х5 mm to wafers 200 mm

SPIN-4000A from MIDAS SYSTEM (Korea) for coating / developing a photoresist or drying with automatic dosing of a photoresist or developer and a programmer (touch screen display) for process control, creating recipes.

The size of the substrates: from pieces of 5x5 mm to plates diam. 300 mm

SPIN-5000A / SPIN-7000A from MIDAS SYSTEM (Korea) for coating / developing a photoresist or drying with automatic dosing of a photoresist or developer and a programmer (touch screen display) for process control, creating recipes.
Spin coater for large substrates

Customized products , Programmable Recipe management , Easy operation , Adopt Drain , Exhaust hole in bowl

MINILAB is a fully equipped lithographic laboratory manufactured by MIDAS SYSTEM (Korea), which includes a Spin coater SPIN-1200T, a Hot plate for photosesist backing, and a station (generator) of deionized water.
The size of the substrates: from pieces of 5x5 mm to plates diam. 100 mm (up to 150 mm - optional)

The Minilab is equipped with a spin coater , hot plate, DI water system and process bath. This equipment can be effectly perfom Photo-lithography for piece to 4inch sample from University and Research center.

Double side photoresist spray coater (MEMS) from CND PLUS (Ю. Корея).

The automatic installation provides spray application of the photoresist on the upper and / or lower sides of the wafer with a diameter of up to 200 mm in one loading cycle.
Application: MEMS and others.

This system is used in many kinds of special coating process including MEMS process and includes both coating function of top/back side.

DAVID series manufactured by CND PLUS (South Korea) is Fully automatic track system for coating and developing a photoresist.

The automatic track system provides work with wafers up to 300 mm and square substrates up to 200x200 mm, simultaneous work with plates of two types 2-4 ”, 4-6”, 6-8 ”and 8-12” is also possible, the built-in climate system ensures stable microclimate parameters in the process chamber. The system meets all the technical requirements for applying thin-film and thick-film coatings and the manifestation of photoresist.
Cassette loading. FOUP cassette optional.

• Automatic 2 sizes of wafer process at the same time.
• SEMI-S2 certification
• Various process application(LED, MEMS, Bumping, GaAs, Glass, Quartz…)
• Multi process flow
• Flexible system configuration
• High productivity and stability
• Design patent

Hot Plate for Photoresist backing

The size of the substrates: from pieces of 5x5 mm to plates of 170x170 mm.
Digital display
Maximum temperature: 350 oC