SWC-3000 table top cleaner from NANO-MASTER Inc.
Single Wafer Cleaners (SWC) focus on providing the best possible cleaning capability while maintaining affordability. A standard system is configured with clean, chemical clean, brush clean, high RPM spin dry with IR heating and N2 flow. Patented megasonic nozzle movement assures uniform delivery of megasonic energy; therefore, at any point on the surface, energy delivered can be kept below damage threshold.
SWC-3000 table top cleaner from NANO-MASTER Inc.
Single Wafer Cleaners (SWC) focus on providing the best possible cleaning capability while maintaining affordability. A standard system is configured with clean, chemical clean, brush clean, high RPM spin dry with IR heating and N2 flow. Patented megasonic nozzle movement assures uniform delivery of megasonic energy; therefore, at any point on the surface, energy delivered can be kept below damage threshold.
SWC-4000 Stand alone single wafer cleanner from NANO-MASTER Inc.
Single Wafer Cleaners (SWC) focus on providing the best possible cleaning capability while maintaining affordability. A standard system is configured with clean, chemical clean, brush clean, high RPM spin dry with IR heating and N2 flow. Patented megasonic nozzle movement assures uniform delivery of megasonic energy; therefore, at any point on the surface, energy delivered can be kept below damage threshold.
SWC-4000 Stand alone single wafer cleanner from NANO-MASTER Inc.
Single Wafer Cleaners (SWC) focus on providing the best possible cleaning capability while maintaining affordability. A standard system is configured with clean, chemical clean, brush clean, high RPM spin dry with IR heating and N2 flow. Patented megasonic nozzle movement assures uniform delivery of megasonic energy; therefore, at any point on the surface, energy delivered can be kept below damage threshold.
LSC-4000 Large substrate cleanner from NANO-MASTER Inc.
Large Substrate Cleaner (LSC) is a stand-alone cleaner which utilizes PC control for substrates up to 21" OD. A LabVIEW interface through a touch screen on the front panel provides greater control compared to the SWC systems and allows for controlled access levels such as operators, process engineers, and maintenance.
LSC-4000 Large substrate cleanner from NANO-MASTER Inc.
Large Substrate Cleaner (LSC) is a stand-alone cleaner which utilizes PC control for substrates up to 21" OD. A LabVIEW interface through a touch screen on the front panel provides greater control compared to the SWC systems and allows for controlled access levels such as operators, process engineers, and maintenance.
SRD cleanner and dryer µSRD-150-B from Mot Semicon.
Системы SRD-отмывки и сушки имеют высокую производительность и обеспечивают качественный и экономичный отмыв и сушку пластин. Корпус установок SRD The MOT SRD suits for all batch applications. The sophisticated MOT μSRD software makes the operation extremely easy by using a Touch Panel; the SRD system offers 10 different built-in process programs according to different wafers. To further simplify operation for the user, a full range of settings can be pre-configured before the MOT μSRD is sent out.
SRD cleanner and dryer µSRD-150-B from Mot Semicon.
Системы SRD-отмывки и сушки имеют высокую производительность и обеспечивают качественный и экономичный отмыв и сушку пластин. Корпус установок SRD The MOT SRD suits for all batch applications. The sophisticated MOT μSRD software makes the operation extremely easy by using a Touch Panel; the SRD system offers 10 different built-in process programs according to different wafers. To further simplify operation for the user, a full range of settings can be pre-configured before the MOT μSRD is sent out.
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