LPCVD for Graphene and CNT growth

REACTOR

• Ø 50 mm-Ø 200 mm quartz tube chamber
• Interchangeable Quartz tubes of various sizes as required
• Accommodates Individual or multiple substrates up to 150 mm x 150 mm
• Upstream end flange with quick connections to gas manifold
• Downstream end flange with quick connections to pumping and gauging

TEMPERATURE/PRESSURE CONTROL

•  The Low Pressure Chemical Vapor Deposition system features a single zone quartz lamp furnace with 6-inch uniform temperature zone
• Auto-tuning feature provides very stable temperature control
• Rapid heating to 1100°C in 10 minutes
• Rapid cooling from 1100°C to 800°C in 2 minutes
• Downstream pressure control 100mTorr to 500Torr using a throttling VAT butterfly valve
• Up to 12 mass flow controllers

OPERATION AND SAFETY

• Safety circuit (hardware and software)
• Flammable gas sensor (H2)
• Enclosed frame and safety guarding
• PC / PLC controller including Windows based recipe and control software
• Editable recipes, data logging, and password-protected access control

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Maskless Aligners are high performance direct exposure systems specifically designed for easy operation and high speed exposures. They offer all the capabilities of a traditional Mask Aligner for single layer and multi-layer applications and even overcome some of the limitations of photomask based exposure technologies. The MLA will eliminate the need for photomasks and shorten your development cycle significantly.

Maskless Aligners are high performance direct exposure systems specifically designed for easy operation and high speed exposures. They offer all the capabilities of a traditional Mask Aligner for single layer and multi-layer applications and even overcome some of the limitations of photomask based exposure technologies. The MLA will eliminate the need for photomasks and shorten your development cycle significantly.