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Main page » Equipment » Technology equipment » SprayCVD, MOCVD, LPCVD

SprayCVD, MOCVD, LPCVD

DLI-CVD, MOCVD MC-050

2-inch DLI-MOCVD / ALD / RTP system for R&D.
Deposition and annealing inside the same chamber.

Applications: DLI-CVD, DLI-ALD, MOCVD, RTP, In-situ annealing capability
Substrate size: up to 2-inch diameter
Temperature max.: 1100°C
Temperature control: thermocouple (optional pyrometer) , fast PID
Vacuum capability: 10-3 Torr (optional turbo pump)
Gas lines: up to 8 gas lines with MFC, one purge line with needle valve
Vaporizers: up to 6 direct liquid injection (DLI) vaporizers
Loading : manual, optional interface for glove-box

2-inch DLI-MOCVD / ALD / RTP system for R&D.
Deposition and annealing inside the same chamber.

Applications: DLI-CVD, DLI-ALD, MOCVD, RTP, In-situ annealing capability
Substrate size: up to 2-inch diameter
Temperature max.: 1100°C
Temperature control: thermocouple (optional pyrometer) , fast PID
Vacuum capability: 10-3 Torr (optional turbo pump)
Gas lines: up to 8 gas lines with MFC, one purge line with needle valve
Vaporizers: up to 6 direct liquid injection (DLI) vaporizers
Loading : manual, optional interface for glove-box

DLI-CVD, MOCVD MC-100, MC-200

4-inch and 8-inch DLI-MOCVD / ALD / RTP system for R&D.
Deposition and annealing inside the same chamber.

MC-100
Applications: DLI-CVD, DLI-ALD, Metals, Alloys…
Substrate size: up to 4-inch diameter
Temperature max.: 800°C
Temperature control: thermocouple, PID control
Vacuum capability: 10-3 Torr (optional turbo pump)
Gas lines: up to 8 gas lines with MFC, one purge line with needle valve
Vaporizers: up to 4 direct liquid injection (DLI) vaporizers
Loading: manual, optional loadlock loading 

MC-200
Applications: DLI-CVD, DLI-ALD, Metals, Alloys…
Substrate size: up to 200 mm diameter
Temperature max.: 800°C
Temperature control: thermocouple, PID control
Plasma: Optional capacitance plasma
Vacuum capability: 10-3 Torr (optional turbo pump)
Gas lines: up to 8 gas lines with MFC, one purge line with needle valve
Vaporizers: up to 4 direct liquid injection (DLI) vaporizers
Loading: manual, optional loadlock loading

 

4-inch and 8-inch DLI-MOCVD / ALD / RTP system for R&D.
Deposition and annealing inside the same chamber.

MC-100
Applications: DLI-CVD, DLI-ALD, Metals, Alloys…
Substrate size: up to 4-inch diameter
Temperature max.: 800°C
Temperature control: thermocouple, PID control
Vacuum capability: 10-3 Torr (optional turbo pump)
Gas lines: up to 8 gas lines with MFC, one purge line with needle valve
Vaporizers: up to 4 direct liquid injection (DLI) vaporizers
Loading: manual, optional loadlock loading 

MC-200
Applications: DLI-CVD, DLI-ALD, Metals, Alloys…
Substrate size: up to 200 mm diameter
Temperature max.: 800°C
Temperature control: thermocouple, PID control
Plasma: Optional capacitance plasma
Vacuum capability: 10-3 Torr (optional turbo pump)
Gas lines: up to 8 gas lines with MFC, one purge line with needle valve
Vaporizers: up to 4 direct liquid injection (DLI) vaporizers
Loading: manual, optional loadlock loading

 

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