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Main page » Equipment » Technology equipment » SprayCVD, MOCVD, LPCVD » DLI-CVD, MOCVD MC-100, MC-200

DLI-CVD, MOCVD MC-100, MC-200

Versatile 4-inch and 8-inch MOCVD system for R&D MC100 and MC200        

Applications
Semiconductor: SiO2, HfO2, Ta2O5, Cu, TiN, TaN, ...
High k Dielectric: SrTiO3, BaTiO3, Ba(1-x)SrxTiO3 (BST)- Ferroelectric: SBT, SBTN, PLZT, PZT
Superconductor: YBCO, Bi-2223, Bi-2212, Tl-- 1223, ...
Piezoelectric: (Pb, Sr)(Zr,Ti)O3, Modified Lead - Titanate
Metals : Pt, Cu, ...
Colossal Magneto Resistance
Thermal coatings
Buffer layers
Mechanical coatings
Optics
Etc...

Specifications
  • The Annealsys MC100 is a cold wall MOCVD reactor especially developed to meet the requirements of research and development units.
The MC100 allows doing heteroepitaxy of oxides on single crystals wafers (such as YBCO/LAO, STO/MgO, MxOy/LAO,…) by MOCVD using a wide
  • range of solid and liquid organometallic volatile precursors using direct liquid injection technology.
The MC100 system can be provided with various vaporization systems and vacuum equipment depending on the application.
  • Pulse pressure CVD capability


Performance & characteristics

  • Temperature range: RT to 800°C

Gas mixing capability with mass flow controllers

  • Vacuum range: Atmosphere to 10-3 Torr

High vacuum optional


The Annealsys MC200 is a 200 mm MOCVD.
Capacitance plasma version is available.

Applications
Semiconductor: SiO2, HfO2, Ta2O5, Cu, TiN, TaN
High k Dielectric: SrTiO3, BaTiO3, Ba(1-x)SrxTiO3 (BST)
Ferroelectric: SBT, SBTN, PLZT, PZT,…
Superconductor: YBCO, Bi-2223, Bi-2212, Tl-1223, …
Piezoelectric: (Pb, Sr)(Zr,Ti)O3, Modified Lead Titanate
Colossal Magneto Resistance
Thermal coatings
Buffer layers
Etc…

Specifications
The Annealsys MC200 is a 200 mm thermally controlled wall CVD reactor especially developed to meet the requirements of research and development units for MOCVD processes.
A capacitance plasma option offer PE-MOCVD capabilities for reducing the deposition temperature.
The direct injection vaporizer allows the widest range of utilization of precursor to develop new materials.
Loadlock and glove box interface are available as optional features

Performance & characteristics
Temperature range: RT to 850°C
Up to 4 vaporizers
Vacuum range: Atmosphere to 10-3 Torr
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