Nanofabrication systems NanoFrazor

NanoFrazor Scholar from HEIDELBERG INSTRUMENTS NANO (SwissLitho AG).

NanoFrazor lithography – based on thermal Scanning Probe Lithography developed at IBM Research – is the fastest and most versatile of all Scanning Probe Lithography techniques.

• Resolution below 20 nm
• In-situ high-speed AFM topography imaging
• Samples size up to 50 x 50 mm2
• Closed-Loop Lithography
• Precise markerless overlay and stitching using in-situ AFM
• No damage of sensitive materials (no electron or ion beams)
• Alternative patterning mode: direct nanoscale thermal conversion
• Small footprint
• Easy to use (no wet development, no vacuum, etc.)
• Unique capabilities help publish in high-impact journals
and receive funding for new projects

NanoFrazor Explore from HEIDELBERG INSTRUMENTS NANO (SwissLitho AG).

• Direct heated probe writing with resolution below 15 nm
• Direct laser sublimation below 1 µm resolution
• In-situ high speed AFM topography imaging
• Sample size up to 100 x 100 mm2
• Closed-Loop Lithography
• Grayscale patterning with unprecedented resolution
and accuracy below 2 nm
• Markerless overlay and stitching using in-situ AFM
for accurate alignment
• Superior acoustic and vibration isolation
• No clean room or special laboratory environment required
• Enables numerous unique possibilities that go beyond
conventional nanolithography
• Upcoming: Multi-Tip patterning and imaging module