SWC-3000 table top cleanner

SWC-3000 table top cleaner from NANO-MASTER Inc.

Single Wafer Cleaners (SWC) focus on providing the best possible cleaning capability while maintaining affordability. A standard system is configured with clean, chemical clean, brush clean, high RPM spin dry with IR heating and N2 flow. Patented megasonic nozzle movement assures uniform delivery of megasonic energy; therefore, at any point on the surface, energy delivered can be kept below damage threshold.

Features

• 12" OD, 7" x 7" substrates
• Table top unit
• Venturi powered vacuum
• Damage free megasonic
• Independent chemical dispenses
• Spin dry with heated N2
• Microprocessor controlled
• Chemical dispense unit
• Safety interlocks
• 19”x26” footprint

Options

• PVA brush cleaning (100 RPM)
• Post CMP brush cleaning (up to 400 RPM)
• Nitrogen ionizer
• CO2 inject with DIW resistivity monitor
• FM4910 Materials