SWC-4000 Stand alone single wafer cleanner

SWC-4000 Stand alone single wafer cleanner from NANO-MASTER Inc.

Single Wafer Cleaners (SWC) focus on providing the best possible cleaning capability while maintaining affordability. A standard system is configured with clean, chemical clean, brush clean, high RPM spin dry with IR heating and N2 flow. Patented megasonic nozzle movement assures uniform delivery of megasonic energy; therefore, at any point on the surface, energy delivered can be kept below damage threshold.

Features

• Four 3.8L HDPE canisters
• Stand alone unit
• Dual drain for acids and solvents
• Suck back valves to prevent drips

Options

• Back side DIW clean and dry
• In-line heaters for DIW or chemicals
• Fill sensors for chemical or DIW leaks