Double side photoresist spray coater (MEMS)

Double side photoresist spray coater (MEMS) from CND PLUS (Ю. Корея).

The automatic installation provides spray application of the photoresist on the upper and / or lower sides of the wafer with a diameter of up to 200 mm in one loading cycle.
Application: MEMS and others.

This system is used in many kinds of special coating process including MEMS process and includes both coating function of top/back side.

Product Facts

• Flexible modular design
• High throughput
• Robot (wafers loader) of own production
• Installation includes:
• Photoresist application module (spray coater)
• Photoresist backing Module (Hot plate)
• Cooling plate module
• Setting wafer pre alignment (pre aligner unit)
• Wafer position control device
• Robot with without contact with the surface of the wafer (non contact arm)
• High uniformity across the wafer
• High wafer-to-wafer process reproducibility
• Convenient and intuitive software for working with the system and creating ready-made recipes
• Compact architecture with robot and cassettes
• Short delivery times and low cost