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MDA-600S Semi-automatic Mask Aligner

New MDA-600S from MIDAS SYSTEM (Корея) - Semi-automatic Mask Aligner. 

Easy operation & Installation , PLC Operation with PC control , Compact size semi auto system , Image grab & Data log , More than 100 Program recipes

  • BSA with CCD camera (Option) 
  • Wafer up to  150 mm
  • Nanoimprint (Option)
  • Semi-Automatic Stage moving during focus anf alignment, Auto Exposure.

Specification

  • Type - PC control semi auto
  • Mask size - up to 7 inch
  • Substrate size - piece to 6 inch circle
  • Uniform beam size - 6.25 * 6.25 inch
  • UV light source - UV Lamp, 350 W
  • Beam wavelength - 350 ~ 450 nm
  • Beam uniformity - <±5 %
  • 365 nm intensity - ~ 25 mW/㎠
  • Alignment method - manual
  • Alignment accuracy - 1 um
  • Process mode - Soft, Hard, Vacuum contact & Proximity
  • Process resolution - 1 um @ 1 um PR thickness with vacuum contact
  • Weight (kg) - 650
  • Dimensions (mm) - 1256(W) * 1151(D) * 1600(H)

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Request by email: info@minateh.ru