MDA-80MS Semi-automatic Mask Aligner

New MDA-80MS from MIDAS SYSTEM (Korea) - Semi-automatic Mask Aligner. 

Easy operation & Installation , PLC Operation with PC control , Compact size semi auto system , Image grab & Data log , More than 100 Program recipes

• BSA with CCD camera (Option) 
• Wafer up to  200 mm
• Nanoimprint (Option)
• Semi-Automatic Stage moving during focus anf alignment, Auto Exposure. 

Specification

• Type - PC control semi auto
• Mask size - up to 9 inch
• Substrate size - piece to 8 inch
• Uniform beam size - 8.25 * 8.25 inch
• UV light source - UV Lamp, 1 kW
• Beam wavelength - 350 ~ 450 nm
• Beam uniformity - <±5 %
• 365 nm intensity - ~ 25 mW/㎠
• Alignment method - manual
• Alignment accuracy - 1 um
• Process mode - Soft, Hard, Vacuum contact & Proximity
• Process resolution - 1 um @ 1 um PR thickness with vacuum contact
• Dimensions (mm)1400(W) * 1100(D) * 1600(H)

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