VPG+ 200/ VPG+ 400 - multi-Purpose Volume Pattern Generators from Heidelberg Instruments Mikrotechnik GmbH (Германия).
VPG+ - High Speed Pattern Generators. 

Our Multi-Purpose Volume Pattern Generators are perfectly suited for the production of standard photomasks as well as for i-line resist applications. An ultra-high-speed exposure engine and automated alignment capability both contribute to systems that excel through high resolution, outstanding image quality, and fast throughput.

Our VPG+ 200 and 400 systems present a perfect solution for applications that use i-line resists such as SU-8 and IP 3600, for example for rapid prototyping applications in microfluidics. In combination with their high speed and resolution, the VPG+ 200 and 400 therefore provide an excellent alternative to an i-line stepper.

Typical applications for the smaller exposure area members of the VPG+ family include such demanding fields as MEMS, advanced packaging, 3D integration, LED production, and compound semiconductors.

KEY FEATURES

• Maximum substrate size: 8” (VPG+ 200) and 16” (VPG+ 400) respectively
• Minimum feature size: Down to 0.75 μm
• Address grid: Down to 12.5 nm
• Maximum write speed (at structure size 4 um): 13500 mm2/min
• Exchangeable write modes
• Real-time autofocus system
• High power DPSS laser with 355 nm wavelength
• Camera system for metrology and alignment
• Closed-loop climate chamber
• Automatic substrate loading system
• Stage map correction
• Edge detector system
• Multiple data input formats (DXF, CIF, GDSII and Gerber)