Box Coaters PVD platform

Box Coaters PVD platform

Large box chambers are perfect for depositing onto large area substrates or batches of many smaller substrates. The increased height of these chambers provides excellent film thickness uniformity, while increases to the width and depth provide space for advanced fixturing options. All box coater system configurations are computer modeled to optimize film uniformity, material yield, and throughput.

Process capabilities:

• resistive thermal evaporation
• sputter deposition
• electron beam evaporation
• ion assisted deposition
• custom available

BIG CHAMBERS. BIG PROGRESS.

DEPOSITION SOURCE OPTIONS

Sputtering 
RF, DC, pulsed DC, HIPIMS, and reactive. Circular, linear & cylindrical cathodes are available.

Thermal Evaporation 
You can utilize a wide range of boats, filaments & crucible heaters. Auto-tuning ensures precise rate control.

Electron Beam Evaporation  
With the Box Coater PVD platform, a wide range of source power and power supply options are available. Programmable sweep controller with recipe storage is controlled through Aeres software platform. A torque sensing crucible indexer detects pocket jams. There is room for multiple e-beam sources in the Box Coater chamber.

Plasma & Ion Beam Processing 
We use a range of ion sources for cleaning and film enhancements, including glow discharge plasma cleaning.

AERES ADVANCED PROCESS CONTROL SOFTWARE

• Batch coating automation is managed with Aeres for excellent process control and repeatability
• PC/PLC controlled recipes for single, batch, or automated processes
• Advanced data logging and process tracking ensure consistent and repeatable processes
• High resolution control provides impressive low rate stability and consistent doping ratios
• Central control station manages each module and schedules the processes in each chamber
• Independent control of multiple chambers (if applicable)
• Complex recipes can be created and modified easily
• Automatic PID control loop tuning significantly reduces process development time