NEBULA Cluster platform
Angstrom’s pinnacle of automation, engineering precision, user control, and collaboration with you, our partner. These Nebula Cluster integrated vacuum systems are designed specifically to meet our clients process requirements. The number and type of vacuum modules are customer selected and provide room for future expansion potential.
- Glove box
- Cassette station (up to 25 wafers)
- Vacuum load lock
- Wafesr up to 200х200 mm, к
- Processes: PVD, LPCVD, ALD, RIE or ICP-RIE, PECVD or ICPECVD
Processes:
resistive thermal evaporation
sputter deposition
electron beam evaporation
ion assisted deposition
ALD
RIE, ICP-RIE
PECVD, ICPECVD
We dream with you to determine the modules that will bring your potential innovations to reality. PVD, CVD, ALD, masking and parking transfer, stages with heating/cooling, sources that assist with cleaning, variable angle deposition and everything else current technology allows. Plus, the Nebula Cluster integrated vacuum system includes a centralized robotic hub connecting everything, all controlled with our integrated and simple to use recipe-driven software.
PROCESS MODULE OPTIONS
- Substrate cleaning and preparation using plasma or ion beam sources
- Multiple vacuum deposition modules are available for PVD, CVD, ALD, & others
- Substrate and mask storage cassettes can accommodate 25 or more sample trays as needed
- Distribution modules using SCARA robots are sized to meet your requirements
- Glovebox environments can be integrated to one or more modules
SUBSTRATE SIZE/THROUGHPUT
- We have built modules that accommodate standard semiconductor wafer form factors, as well as typical display glass, including modules for Gen. 2 (360 mm x 465 mm) and larger.
- Throughput depends on process duration and complexity. However, the AERES software platform optimizes layer to layer transitions to reduce overall process time
AERES ADVANCED PROCESS CONTROL SOFTWARE
- Simple to use yet highly sophisticated
- PC/PLC controlled recipes for single, batch, or automated processes
- Advanced data logging and process tracking ensure consistent and repeatable processes
- High resolution control provides impressive low rate stability and consistent doping ratios
- Central control station manages each module and schedules the processes in each chamber
- Independent control of multiple chambers
- Complex recipes can be created and modified easily
- Automatic PID control loop tuning significantly reduces process development time
Brochure in PDF
