3-inch RTP system for laboratories.
Dual chamber version for cross contamination issues
Applications
- Rapid Thermal Annealing (RTA)
- Implantation annealing
- Compound semiconductor annealing
- Crystallization and Densification
- Selezination and Sulfurization
- Etc...
Specifications
- Three-inch rapid thermal processor
- Compact table top configuration
- Dedicated to research applications
- Sample size: few square millimeters up to 3-inch diameter
- Optional 3-inch susceptor for 2-inch sample
- Quartz tube with stainless steel flanges process chamber
- Tubular infrared halogen lamps furnace
- Very fast ramp rates
- Horizontal motion door with quartz tray for easy loading and unloading of the wafers and thermocouple installation.
Performance & characteristics
- Temperature range: RT to 1250°C
- Ramp rate up to 250°C/s on 2-inch diameter silicon substrate, 200°C/s on 3-inch
- Gas mixing capability with mass flow controllers
- Vacuum range: Atm to 10-3 Torr (10-6 Torr with optional turbo pump)
- Thermocouple temperature measurement and the fast digital PID temperature controller assure high and stable temperature control across the temperature range.
- Optional pyrometer control.
- The system is provided with full PC control with Windows compatible software.
