RTP system with square chamber
For substrates up to 200 mm x 200 mm
Multiple system configurations
Applications
RTA (Rapid Thermal Annealing)
RTO (Rapid thermal oxidation)
Diffusion
Selenization, sulfuration
Compound semiconductor annealing
Nitridation, Silicidation
Crystallization and Densification
Specifications
The AS-Premium system can process samples up to 200x200 mm² samples.
The reactor platform and the machine have been designed to accommodate a wide range of configurations to meet the process requirements of our customers.
The chamber can receive a single side or a double side lamp heating furnace. The design of the process chamber allows manual loading or the connection to a cluster tool or a glove box (options).
Pyrometer and thermocouple temperature control are standard features. The fast digital PID temperature controller provides high temperature reproducibility.
Graphite and silicon carbide coated graphite susceptors are available for processing of samples with encapsulation.
