200mm Versatile RTP system
RTCVD capability (option)
From RT to 1500°C down to 10E-6 Torr.
Applications
- Rapid Thermal Processing (RTA, RTO...)
- SiC contact annealing, Carbonization
- Compound semiconductor annealing
- Implant quality control
- RTCVD (poly silicon, SiO2, SiNx,…)
- Etc…
Specifications
- The AS-Master rapid thermal processor is a highly versatile tool allowing a wide range of processes from annealing to rapid thermal
Chemical Vapor Deposition.
- The high temperature version can run annealing processes up to 1500°C and allows new process development. Optional square chamber is available for large square or rectangular samples processing.
- The cold wall chamber technology provides high process reproducibility under ultra clean and contamination-free environment.
- Loadlock and cluster tool module versions are available for improved process environment cleanness.
- The extended temperature range, the vacuum performance (atmosphere to 10-6 Torr) and gas mixing capability make AS-Master suitable for a large range of RTP and RTCVD processes.
- Pyrometer and thermocouple temperature measurement associated with fast digital PID temperature controller provide high and stable temperature accuracy.
- Manual loading and cassette to cassette versions make system suitable for process development and easy transfer to production.
Performance & characteristics
- Temperature range: RT to 1500°C
- Ramp rate up to 200°C/s
- Gas mixing capability with mass flow controllers
- Vacuum range: Atmosphere to 10E-6 Torr
