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The design of the SVCS atmospheric diffusion furnaces combines the multiple process capability with the needs of a maximum capacity for full production system (SVaFUR-FP) and high flexibility small scale versions for use in research and pilot production (SVaFUR-RD). It provides an easy-to-maintain, safe and reliable horizontal furnace platform.
The SVCS design is outstanding for high efficiency, minimised footprint and low cost of ownership while offering high process flexibility.
| Wafer size | 150mm, 200mm, 300mm or any custom size |
| Wafer load | FP: 150+ RD: 25 (typical) |
| Heating system | 3 or 5 zone |
| Flat zone | FP: up to 1067 mm (42″) RD: down to 300 mm (12″) ± 0.5°C across flat zone |
| Process temperature | 200°C to 1300°C |
| Power consumption | 95kW – 165kW depending on tube configuration |
| Power supply | 150 mm: 3-phase, 400 or 480VAC, 140 A, 50 or 60 Hz 200 mm: 3-phase, 400 or 480VAC, 160A, 60Hz (system is adapted to country- specific power supply network) |
| Clean dry air | 70 – 110 psig (4,8 to 7,6 bar) |
| Cooling water | 40 – 60 LPM |
| Exhaust | 210m³/h per tube |
| Options | Boat elevator and wafer handling automation |
Laboratory table top Horizontal Diffusion Furnace (SVCS)
Ideally suited for R&D laboratories and pilot production
The SVCS Tabletop Furnace system provides a semiconductor grade quality tool for universities, R&D laboratories and pilot fabs. This system can be used for wide range of processes due to outstanding flexibility and amount of optional modules available to meet special and often unique requirements of every customer.
Laboratory table top Horizontal Diffusion Furnace (SVCS)
Ideally suited for R&D laboratories and pilot production
The SVCS Tabletop Furnace system provides a semiconductor grade quality tool for universities, R&D laboratories and pilot fabs. This system can be used for wide range of processes due to outstanding flexibility and amount of optional modules available to meet special and often unique requirements of every customer.
Horizontal LPCVD Furnace from SVCS (Чехия).
The design of the SVCS Low Pressure Chemical Vapor Deposition furnaces combines the multiple process capability with the needs of a maximum capacity for full production system (SVcFUR-FP) and high flexibility small scale versions for use in research and pilot production (SVcFUR-RD). It provides an easy-to-maintain, safe and reliable horizontal furnace platform.
Horizontal LPCVD Furnace from SVCS (Чехия).
The design of the SVCS Low Pressure Chemical Vapor Deposition furnaces combines the multiple process capability with the needs of a maximum capacity for full production system (SVcFUR-FP) and high flexibility small scale versions for use in research and pilot production (SVcFUR-RD). It provides an easy-to-maintain, safe and reliable horizontal furnace platform.
The design of the SVCS Plasma Enhanced Chemical Vapor Deposition furnaces combines the multiple process capability with the needs of a maximum capacity for full production system (SVpFUR-FP) and high flexibility small scale versions for use in research and pilot production (SVpFUR-RD). It provides an easy-to-maintain, safe and reliable horizontal furnace platform.
The design of the SVCS Plasma Enhanced Chemical Vapor Deposition furnaces combines the multiple process capability with the needs of a maximum capacity for full production system (SVpFUR-FP) and high flexibility small scale versions for use in research and pilot production (SVpFUR-RD). It provides an easy-to-maintain, safe and reliable horizontal furnace platform.
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